Photolithography is a process where light is used to change the solubility of a photoresist on your sample. This table-top instrument is used for the direct writing of patterns in resist spin-coated onto samples. The exposure is performed by means of a laser source.
The POLOS NanoWriter Advanced uses a highly focused laser beam to directly expose photoresists, enabling us to change the designs of fabricated nanodevices on the fly. This will allow for faster prototyping of the nanodevices we are working on, reducing the time necessary to obtain fully functional and optimized nanostructures.
Equipped with a 405 nm laser with a spot size of 300 nm the laser writer will enable us to write patterns with resolution down to hundreds of nanometers, on a range of substrate types, varying in size from 1 cm chips to 4 inch wafers.
The laser writer adds flexibility to our nanofabrication protocols, as it complements the existing capabilities of the equipment that we currently use in the cleanroom. The NanoWriter provides, for example, higher resolution than our photolithography mask aligner system and allows for faster patterning than our electron-beam lithography system.
Specifications:
- Wafer sizes up to 4" (100 mm)
- Can write structures with < 300 nm features
- Top-side alignment
- Long-lifetime, 405 nm diode laser
- Raster mode (GDS, BMP files) or vector mode (Gerber format)
- 4095 grayscale levels
- Autofocus
- 0.3 µm high-res write mode
